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Member

Join Date: Jan 2010
Posts: 9

Sapphire Wafers and Standard Clean 1

01/14/2010 1:55 PM

Hi,

I was hoping to get a bit of information regarding the RCA standard Clean 1 process for the cleaning of Sapphire wafers in the Semiconductor industry.

I am currently designing the appropriate facilities to accompany a new peice of equipment and my question deals with the "waste water" that comes from the process.

The process uses 1:1:5 ratio of H2O2(hydrogen Peroxide):NH4OH Ammonium Hydroxide: H2O(18 MOhm DI water). I am wondering what the end result of this mixture will become,ie the PH level, potential off gases and hazards. Being a Mechy my chemistry is a bit rusty(perhaps underdeveloped). Thanks for any help!

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Pathfinder Tags: SC-1 Semiconductor Wafer Cleaning
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Guru

Join Date: Dec 2006
Location: Germany 49° 26' N, 7° 46' O
Posts: 1950
Good Answers: 109
#1

Re: Sapphire Wafers and Standard Clean 1

01/15/2010 2:53 AM

Hi,

do you have a copy of the Handbooks from:

a.Vossen and Kern

and

b. Meissel and Glang?

Search for "Thin Film Technology"

RHABE

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