Sapphire Wafers and Standard Clean 1

Mophat Member Join Date: Jan 2010 Posts: 9	Sapphire Wafers and Standard Clean 1 01/14/2010 1:55 PM
	Hi, I was hoping to get a bit of information regarding the RCA standard Clean 1 process for the cleaning of Sapphire wafers in the Semiconductor industry. I am currently designing the appropriate facilities to accompany a new peice of equipment and my question deals with the "waste water" that comes from the process. The process uses 1:1:5 ratio of H2O2(hydrogen Peroxide):NH4OH Ammonium Hydroxide: H2O(18 MOhm DI water). I am wondering what the end result of this mixture will become,ie the PH level, potential off gases and hazards. Being a Mechy my chemistry is a bit rusty(perhaps underdeveloped). Thanks for any help!
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	Pathfinder Tags: SC-1 Semiconductor Wafer Cleaning

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RHABE Guru Join Date: Dec 2006 Location: Germany 49° 26' N, 7° 46' O Posts: 1950 Good Answers: 109	#1 Re: Sapphire Wafers and Standard Clean 1 01/15/2010 2:53 AM
	Hi, do you have a copy of the Handbooks from: a.Vossen and Kern and b. Meissel and Glang? Search for "Thin Film Technology" RHABE
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