Sapphire Wafers and Standard Clean 1

Hi,

I was hoping to get a bit of information regarding the RCA standard Clean 1 process for the cleaning of Sapphire wafers in the Semiconductor industry.

I am currently designing the appropriate facilities to accompany a new peice of equipment and my question deals with the "waste water" that comes from the process.

The process uses 1:1:5 ratio of H2O2(hydrogen Peroxide):NH4OH Ammonium Hydroxide: H2O(18 MOhm DI water). I am wondering what the end result of this mixture will become,ie the PH level, potential off gases and hazards. Being a Mechy my chemistry is a bit rusty(perhaps underdeveloped). Thanks for any help!