I'm all about extreme sports AND Extreme science, so when I hear about Extreme Ultraviolet radiation (EUVL), I'm ready for a little damage. As the article states, "EUVL may be the next-generation patterning technique used to produce smaller and faster microchips with feature sizes of 32 nanometers and below. However, durable projection optics must be developed before this laboratory technique can become commercially viable."
making mirrors as smooth and durable to handle such extreme reflection has been a problem because the "trace levels of water vapor and hydrocarbons typically found in the vacuum environment of EUV first-generation exposure tools can lead to rapid corruption of the EUVL mirror surfaces."
And the quest for the perfect mirror goes on...
Scattering
