Hello everyone, I've recently noticed a problem while sputtering a zinc sulfide (ZnS) target: in some cases, the sputtering results appear uneven. For example, the film is thicker in some areas and thinner in others. Has anyone else encountered this?
I'd like to know what you think causes this uneven sputtering? Is it due to the quality of the target itself, or is it due to improper sputtering parameters, such as gas pressure, power density, or the distance and angle between the target and substrate?
Also, are there any methods or techniques to resolve this issue? For example, adjusting sputtering parameters, optimizing target quality, or other solutions?
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Focus on inorganic materials, sputtering targets, and thin film technologies. Interested in high-purity metals, ceramics, and functional compounds for semiconductor, optics, and renewable energy applications.
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