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Join Date: Sep 2025
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Uneven Sputtering of Zinc Sulfide Target

09/10/2025 10:05 PM

Hello everyone, I've recently noticed a problem while sputtering a zinc sulfide (ZnS) target: in some cases, the sputtering results appear uneven. For example, the film is thicker in some areas and thinner in others. Has anyone else encountered this?

I'd like to know what you think causes this uneven sputtering? Is it due to the quality of the target itself, or is it due to improper sputtering parameters, such as gas pressure, power density, or the distance and angle between the target and substrate?

Also, are there any methods or techniques to resolve this issue? For example, adjusting sputtering parameters, optimizing target quality, or other solutions?

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Guru

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#1

Re: Uneven Sputtering of Zinc Sulfide Target

09/11/2025 9:04 PM

To make a uniform sputtered coating, precisely control vacuum chamber pressure (10-100 mTorr), use an inert gas like Argon, maintain a stable plasma by adjusting voltage, ensure proper target cooling, and position the substrate effectively. The uniformity is achieved by the even distribution of sputtered atoms from the target, which is influenced by gas pressure, deposition time, and the geometry of the coating system.

link....

https://www.semicore.com/news/94-what-is-dc-sputtering

Sputtering zinc sulfide (ZnS) involves bombarding a high-purity ZnS target with energetic ions to eject atoms or molecules, which then deposit onto a substrate to form a thin film. This magnetron sputtering or reactive sputtering process allows for the creation of ultimately pure and functional ZnS thin films for applications in electronics, optics, and solar cells. The process parameters, such as substrate temperature and the type of ions used, can be varied to control the structural, electrical, and optical properties of the deposited ZnS films.

https://www.lesker.com/newweb/deposition_materials/depositionmaterials_sputtertargets_1.cfm?pgid=zn5

https://www.msesupplies.com/products/mse-pro-zinc-sulfide-sputtering-targets-zns?srsltid=AfmBOorgYyTaH9LhcTi2Xez27LDA4KY_Az4ozMeh0hyd7GRvk4jto_5p

The parameters must be adjusted to meet the target requirements...some materials are not suitable for ZnS sputtering targets...

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#2

Re: Uneven Sputtering of Zinc Sulfide Target

09/12/2025 4:07 AM

How big is the substrate, is the unevenness random or in one area? Is the target stationary during coating or are you using a planetary coater?

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Join Date: Sep 2025
Location: Bergener Straße 14., 30625 Hannover, Germany.
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#4
In reply to #2

Re: Uneven Sputtering of Zinc Sulfide Target

09/15/2025 1:58 AM

The substrate size is 3 inches. The surface roughness is randomly distributed. The target remains stationary during the coating process.

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#3

Re: Uneven Sputtering of Zinc Sulfide Target

09/12/2025 4:08 AM

Hi, it would help if you could give some information regarding the size and structure of the materials you are trying to coat and how big the items are.
Also what Disposition thickness are you using ? As (ZnS) is usually measured in nm what differences are you noticing and how are you measuring ?
I have been involved in some Splutter Projects, one where we had a an Interior Mirror in a car which used the Mirror surface as a capacitive "Touch-screen" to turn the interior lights on and off.
Off-Topic: Notice you are based in Hannover, I'm based near Walsrode, just 30 miles up the road from you.

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